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• Ion Milling for SEM. Results for a semiconductor device, showing the application of the Model 1010 to SEM Cross Sections.
  
  
• Ion Milling for EBSD. Results showing the improvement in electron backscattered diffration pattern quality after removal of the mechanical polished damage layer via ion milling.
  
  
• "Materials Specimen Preparation for Transmission Electron Microscopy",
  P.E. Fischione, Unpublished.